Improving production efficiency by ~25%
EUV pellicle requires a unique combination of optical, thermal, mechanical and chemical properties.
Canatu’s Carbon NanoBuds (CNB) can be printed over an open border that form a freestanding membrane. This unique nano-structure can be used as an EUV pellicle. Key properties of the freestanding CNB membrane structure include:
- extremely high EUV transparency
- high heat stability
- robustness to pressure differentials
- nano-scale filtering capabilities
- high uniformity
As an outcome, EUV pellicles based on Canatu´s CNB membranes can improve the production efficiency by ~25%.
Protecting photomask from defects
Extreme Ultraviolet Lithography (EUV) is the latest technology for the lithography machines that are used to produce semiconductors such as logic and memory chips. EUV has 3-6 times shorter cycle times compared to the critical multi-patterning layers.
EUV pellicle is a thin, transparent membrane that protects the photomask from defects.
One of the most critical development areas is to improve transmission losses over the conventional (pSi) pellicle solution: each time light passes through the pellicle, 17% of energy is lost, resulting up to 30% loss of energy during the transmission of light.
Read more about our technology.