Membrane
Carbon nanotube membranes for high-power EUV lithography and space applications. The most advanced carbon nanotubes, made with our proprietary synthesis and direct dry deposition method. Tailored to your precise needs.
Unique membrane properties
Carbon nanotubes are emerging as the most promising material for advancing EUV lithography. Our proprietary synthesis and direct dry deposition method yield high purity, ultra-strong carbon nanotubes, built to endure extreme conditions in high-power EUV lithography and space applications.
Our versatile platform technology, coupled with our profound technical expertise, empowers us to customize carbon nanotube membranes to meet your precise requirements. These membranes can be used as particle filters or optical filters, and offer a distinctive set of properties, including high EUV/X-Ray transmittance (>97%T), minimal flare, and exceptional thermal resistance (>1500°C).
- Tailored to meet your specific requirements: tunable and functionalized to provide the exact properties necessary for each application.
- High transmittance: maximize throughput with more EUV light reaching the wafer
- Low flare (scattering): print the tiniest features with precision
- Extreme durability: thrive in the vacuum chamber with high heat resistance and pressure tolerance.
High EUV transmittance
The Canatu carbon nanotube (CNT) membrane offers exceptionally high EUV transmittance (>97%T at EUV / X-Ray) and low flare (scattering). These features are critical especially in EUV lithography where carbon nanotube membranes can be used as EUV pellicles to protect the photomask from particles and contaminants.
High heat resistivity
The Canatu carbon nanotube membrane has high heat resistivity. Depending on the environment, our carbon nanotube membranes can tolerate up to 1500°C without breaking or decomposing. CNT membranes have much higher heat resistivity compared to quartz which breaks at 1200°C, or polyimide which decomposes at below 520°C.
Download technical paper
Download SPIE Photomask + EUVL Conference proceedings to learn more about our versatile platform technology, unique synthesis and direct dry deposition methods, common variations, and potential applications for our carbon nanotube membranes.
Download technical paper
EUV pellicles
Carbon nanotube pellicles protect the photomask from particles and contaminants, ensuring defect-free chip production. High EUV transmittance, built to withstand 600 W. Extreme durability to thrive in the vacuum chamber with high heat resistance and pressure tolerance.
Mass production of carbon nanotube membranes
Since 2021, Canatu has been mass producing carbon nanotube membranes for the semiconductor industry. Our unique proprietary synthesis and direct dry deposition method yield carbon nanotubes with exceptional strength and purity. These advanced carbon nanotubes are meticulously engineered to perform exceptionally well in the most demanding conditions, particularly in the next-gen high power extreme ultraviolet (EUV) lithography and space applications.
Our unique expertise lies in customizing carbon nanotube membranes to precisely match your requirements. We are capable of manufacturing carbon nanotube membranes in a range of sizes, shapes, thicknesses, and structures. Our expertise extends to adjusting the membrane properties to meet the needs of your end application. Additionally, Canatu has the expertise to further modify the properties of carbon nanotube structures through chemical functionalization or coating.
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The next-gen EUV scanner will introduce high power levels of over 500W, enabling the next step in efficiency. Higher power levels and reticle acceleration cause high heat loads and mechanical stress on the EUV pellicles. Carbon nanotubes have emerged as the most promising material for EUV pellicles used in high power EUV scanners due to their mechanical and thermal properties. See article.
Semiconductors are all around us in every single electronic device we use. That is how they make an impact in our everyday. Progress in the semiconductor industry continues fast driven by Moore’s Law. Canatu CNT plays a role in enabling breakthroughs in the rapidly changing semiconductor industry. See more.
EUV pellicles made of Canatu CNT are critical enablers of high yield and throughput in high-volume semiconductor manufacturing, offering unique benefits that are unparalleled by other materials. See product.
Canatu CTO Ilkka Varjos presented free-standing CNT membrane platform technology at SPIE Photomask + EUVL 2021. His talk focused on the unique qualities of Canatu CNT, extensive customizability of the CNT synthesis and post-processing, and application potentials. See press release.
Developed for the European Space Agency’s future X-Ray space telescope the Athena, the optical filter using Canatu CNT could enable further visibility to space. See press release.
Canatu has the expertise to effectively adapt carbon nanotubes for different contexts and uses. The customizability and versatility of our synthesis process makes Canatu CNT ideal for highly engineered solutions. Discover differences.
The discovery of new things is deep in Canatu’s DNA. From the beginning, we have explored uncharted territory with curiosity. While our experts solve the issues of today, they are also working on what’s to come. To future developments.
