SPIE Photomask Technology + EUV Lithography
Canatu will exhibit at SPIE Photomask Technology + EUV Lithography 2024 from September 29 to October 3, 2024. Visit us at booth 403 in the Monterey Conference Center, California, USA.
About SPIE PUV
SPIE PUV is a leading event in the semiconductor industry, focusing on mask making, EUV lithography, emerging technologies, and mask business.
Exhibition dates and times
- Tuesday, 1 October 2024 from 10:00 AM – 4:00 PM
- Wednesday, 2 October 2024 from 9:30 AM – 4:00 PM
Showcase highlight
Canatu will present advanced CNT membranes, known for their exceptional uniformity, high EUV/X-Ray transmittance (>97%), thermal resistance (>1500°C), and mechanical strength. CNT membranes excel in extreme environments and can be used across various applications, including EUV pellicles, debris filters, and optical filters.
About Canatu
Canatu specializes in developing, manufacturing, and licensing custom CNT synthesis reactors for producing carbon nanotube (Canatu CNT) membranes and conductive films. Our patented Floating Catalyst Chemical Vapor Deposition (FC-CVD) reactors and Dry Deposition™ process deliver the most advanced carbon nanotubes for highly engineered solutions.
Featured Products
Performance: Enables 7-15% higher wafer throughput compared to conventional pellicles.
Key Features:
- 97% EUV transparency
- High heat stability
- Robustness to pressure differentials
- Nanoscale filtering capabilities
- High uniformity
Applications: The next-gen EUV scanner, with over 500W power, boosts efficiency but increases heat and mechanical stress on the EUV pellicles. Carbon nanotubes, known for their superior mechanical and thermal properties, are the leading material for EUV pellicles in high-NA EUV lithography.
Performance: Optical filters using Canatu CNT exhibit high transmittance at EUV and X-Ray wavelengths, resistance to pressure differentials, and chemical inertness; selectively blocking UV, DUV, visible, and infrared radiation.
Key features:
- Ultra-thin filters on a frame, coated or non-coated
- High EUV/X-Ray transmittance, selectively blocking UV, DUV, visible, and infrared radiation
- Free-standing membrane or supported with a novel all-carbon mesh for improved EUV/X-Ray transmittance and spectral purity
- High mechanical strength and durability
- Compatible with high-vacuum and differential pressure environments
- Exceptional thermal stability and chemically inert
Applications: These optical filters allow certain wavelengths of light (e.g. X-rays or EUV) to pass through while blocking others (e.g. visible, infrared, or deep ultraviolet). They can be used in EUV tools to filter specific wavelengths, or placed in front of X-ray detectors to block unwanted particles, electrons, and photons, all while withstanding high temperatures and pressure differentials. Canatu’s optical filters are versatile, suitable for a wide range of EUV and X-ray applications including EUV mask inspection, X-ray astronomy, microscopy, e-beam filtration, and more.
3. Debris Filters
Performance: Similar to optical filters, Canatu’s debris filters offer high heat resistivity and EUV light transmission. Canatu has mass-produced debris filters since 2021.
Applications: These debris filters using Canatu CNT are used in various applications, including, but not limited to, EUV mask inspection before and after lithography process. They stop particles created by EUV light sources from contaminating or damaging the sensitive and expensive optics or masks, promoting high-quality, defect-free processes.
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