SPIE Photomask Technology + EUV Lithography
Meet Canatu team in Monterey, California, during October 1-5 at this year’s SPIE Photomask Technology + EUV Lithography event; the premier worldwide technical meeting for mask makers, EUVL, and emerging technologies! The five-day event is a great opportunity to discuss current research, hear the latest breakthroughs, and connect with peers across the semiconductor industry.
Presentation by Canatu Jarkko Etula, October 5, 9:15-9:30 AM PDT
We are thrilled to invite you all to our Thursday’s presentation ‘Carbon nanotube membranes for EUV photolithography: a versatile material platform’ at 9:15-9:30 by Canatu nanomaterial engineer Jarkko Etula. The Canatu presentation will be a part of the International Conference on Extreme Ultraviolet Lithography 2023, session 8 on EUV pellicles. See the entire program here.
Abstract
The next generation of EUV photolithography introduces higher heat loads and mechanical stresses on pellicles. Here we manufacture carbon nanotube (CNT) pellicles directly from a floating catalyst chemical vapor deposition (FC-CVD) reactor, using a direct dry deposition method. This yields high uniformity CNT pellicles of high strength and purity, enabling exceedingly thin pellicles with high EUV transparency. FC-CVD synthesis allows tailoring of CNT diameter and wall count (SWCNT or FWCNT), as well as CNT network density and bundle size. Combining this direct method with the exceptional properties of CNTs provides a versatile membrane platform, modifiable with post processes such as purification to remove metal impurities, or functionalization to match the specific deposition chemistry required by coating processes. Thicker CNT membranes are also suitable for other roles, such as filtering debris from EUV source, blocking DUV photons, or providing a gas seal for differential pressure.
Presenter
Jarkko Etula is an engineer and nanomaterial specialist at Canatu, responsible for spearheading the development of carbon nanotube membranes for the past 3 years, with emphasis on EUV pellicle manufacturing and post processing. His background involves 8 years of academic and industrial experience in carbon nanomaterials, thin film deposition processes, and characterization techniques, with 27 peer-reviewed publications and h-index of 12.
Contact
Book a meeting
Our team is available for private meetings during the whole event on October 1-5. Book a meeting by filling out the form below.
