SPIE Photomask Technology + EUV Lithography 2025

Join us at SPIE Photomask Technology + EUV Lithography 2025 on September 23-25, 2025 in Monterey Conference Center, to explore our latest samples and to discuss how Canatu can enable the next step in semiconductor performance. SPIE Photomask Technology + EUV Lithography is a leading event in the semiconductor industry, focusing on mask making, EUV lithography, emerging technologies, and mask business. At booth 300, Canatu will exhibit the latest developments, including CNT pellicle membranes, inspection membranes, and optical filters.

Enabling the next step in semiconductor productivity

Canatu CNT pellicle membranes support the productivity increase potential in the EUV lithography process by up to 8-15%

Enhancing quality control in pre-and post-lithography processes

Canatu inspection membranes are used in patterned EUV mask inspection to filter debris generated by the EUV light source, protecting the collector mirror from contamination.

Improving measurement precision in EUV process monitoring

Canatu optical filters block short-wavelength photons and high-energy particles that can interfere with the measurement process, while providing high EUV/X-Ray transmittance.

Creating advanced CNT membranes using CNT100 SEMI reactors and Dry Deposition process

Canatu develops advanced CNT membranes using its patented Dry Deposition process and CNT100 SEMI reactors. We design, manufacture, and sell these reactors, and license the technology to enable customers to produce CNT membranes under a limited license. The CNT100 SEMI reactor is specifically tailored for high-precision CNT membrane production. In 2024, Canatu shipped its first two CNT100 SEMI reactors used for CNT pellicle membrane production.

Visit Canatu at booth #300 to explore our latest samples and connect with our experts. Fill out the form below to book a meeting with the Canatu team!