Debris filters
Canatu debris mitigation filters prevent EUV particles from contaminating or damaging the photomask and sensitive optics, ensuring safe and accurate actinic inspection process.
Debris filters for EUV mask inspection
Canatu debris filters made of carbon nanotube (CNT) membrane are designed to ensure quality control by protecting the photomask during the EUV actinic inspection process. They prevent EUV-generated debris from contaminating the reticle and sensitive optics, while maintaining high EUV light transmission for accurate inspection. In mass production since 2021, they are perfectly suited for particle control for semiconductor manufacturing.
- Prevents particle contamination of photomask by filtering debris from the EUV light source and optical path
- >97% EUV transmittance while selectively blocking UV, DUV, visible, and infrared radiation for optimal light passage, enabling accurate defect detection
- Ultra-thin transparent debris filters with exceptional mechanical strength and long-term durability
- Withstands high-vacuum and differential pressure environments due to high tolerance to pressure pulses
- Flexible fabrication onto selected frames with a novel all-carbon mesh structure
- Customizable coating thickness enabling gas sealing and differential pressure control
How CNT debris filters enable EUV mask inspection
EUV mask inspection has become critical for detecting nanoscale defects that can affect millions of chips. To mitigate debris generated by EUV light, debris filters made of carbon nanotube (CNT) membranes became a key enabler for reliable EUV inspection, with their unique combination of high EUV transmission and durability.
Advanced debris filters for EUV Lithography
Made of Canatu proprietary CNT membrane, these debris mitigation filters leverage the unique properties of carbon nanotubes to deliver robust, ultra-thin, and highly transparent protection in critical pre- and post- lithography processes.
Functionality
Prevent particle contamination: Ensures contamination is minimized within the tool, including mirrors, photomask and EUV pellicle. This debris filters are utilized in EUV mask inspection to improve quality control and to protecting masks from potential contamination by the contamination source.
Current and potentials applications
Canatu debris filters are currently used in pre- and post-lithography processes to filter particles, block DUV photons and/or electrons, and provide gas seal for differential pressure. They can be used in various applications, including, but not limited to, EUV mask inspection before and after the lithography process for EUV mask qualifying tools to enhance quality control.
Exceptional properties suited for any environment
High EUV transmittance: Ensures optimal light passage for accurate defect detection
Flawless mask inspection: Prevents contamination from EUV light source and optical path, ensuring defect-free mask
Extended lifespan: Enables lower inspection machine power usage, extending the laser source’s lifespan and reducing service interval.
Download technical paper
Get a more detailed overview of our debris filters, CNT technology and synthesis.
Download technical paper
All-carbon mesh
A novel mesh structure manufactured from Canatu CNTs provides an alternative to conventional metal meshes. This carbon mesh can be fabricated in practically any size, shape, or thickness, and can be attached to any frame provided.
- Enhanced mechanical properties
- Excellent film-to-mesh adhesion
- Stops film tear propagation after puncture
- A wide range of shapes and dimensions to minimize EUV transmittance loss
- Retains spectral purity in EUV and X-ray applications
Contact our specialist in debris filters
