SPIE Photomask Technology + EUVL 2026

Join us at SPIE Photomask Technology + EUV Lithography 2026 on September 8-11, 2026 in Monterey Conference Center, to explore our latest samples and to discuss how Canatu can enable the next step in semiconductor performance. SPIE Photomask Technology + EUV Lithography is a leading event in the semiconductor industry, focusing on mask making, EUV lithography, emerging technologies, and mask business. At booth 208, Canatu will exhibit the latest developments, including CNT pellicle membranes, inspection membranes, and spectral purity filters.

Enabling the next step in semiconductor productivity

Canatu CNT pellicle membranes support the productivity increase potential in the EUV lithography process by up to 8-15%

Enhancing quality control in EUV mask inspection processes

Canatu inspection membranes are used in EUV mask inspection to filter debris generated by the EUV light source, protecting mask and optics from contamination.

Improving measurement precision in EUV process monitoring

Canatu spectral purity filters block short-wavelength photons and high-energy particles that can interfere with the measurement process, while providing high EUV/X-Ray transmittance.

Creating advanced CNT membranes using CNT100 SEMI reactors and Dry Deposition process

Canatu produces advanced CNT membranes using its patented Dry Deposition process and CNT100 SEMI reactors. The CNT100 SEMI reactor is tailored for high-precision CNT pellicle membrane production. In 2024, Canatu shipped its first two CNT100 SEMI reactors. The first reactor received Site Acceptance Test approval in July 2025.

Visit Canatu at booth #208 to explore our latest samples and connect with our experts. Fill out the form below to book a meeting with the Canatu team!